MASS-SPECTRA ANALYSES OF IMPURITIES AND ION CLUSTERS IN AMORPHOUS AND CRYSTALLINE SILICON FILMS

被引:15
作者
FELDMAN, C
SATKIEWICZ, FG
机构
[1] JOHNS HOPKINS UNIV, APPL PHYS LAB, SILVER SPRING, MD 20910 USA
[2] GCA CORP, TECHNOL DIV, BEDFORD, MA 01730 USA
关键词
D O I
10.1149/1.2403640
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
引用
收藏
页码:1111 / 1116
页数:6
相关论文
共 19 条
[1]  
ALLAM DS, 1967, JUL P S MASS SPECTR, P139
[2]  
BARRINGTON AE, 1966, PROGR NUCLEAR ENER 9
[3]   MASS SPECTROGRAPHIC STUDY OF MOLECULAR CARBON IONS FORMED IN A SPARK SOURCE [J].
BAUN, WL ;
HODGSON, FN ;
DESJARDINS, M .
JOURNAL OF CHEMICAL PHYSICS, 1963, 38 (11) :2787-&
[4]  
BIEBL HJ, 1963, J APP PHYS, V34, P2893
[5]  
Blum N. A., 1972, Journal of Non-Crystalline Solids, V11, P242, DOI 10.1016/0022-3093(72)90006-3
[6]  
CHUPAKHIN MS, 1967, J ANAL CHEM-USSR, V22, P325
[7]  
CRAIG RD, 1966, VACUUM, V16, P67
[8]   STUDY OF AMORPHOUS AND CRYSTALLINE SILICON THIN-FILMS BY SPUTTER-ION SOURCE-MASS SPECTROMETRY [J].
FELDMAN, C ;
SATKIEWICZ, FG .
THIN SOLID FILMS, 1972, 12 (02) :217-+
[9]  
Grigorovici R., 1969, Journal of Non-Crystalline Solids, V1, P303, DOI 10.1016/0022-3093(69)90027-1
[10]  
Herman F., 1972, J NON-CRYST SOLIDS, V8-10, P359, DOI [10.1016/0022-3093(72)90160-3, DOI 10.1016/0022-3093(72)90160-3]