OXIDE CHARGE TRAPPING INDUCED BY ION-IMPLANTATION IN SIO2

[1] DONOVAN RP, 1972, J APP PHYS COMMUNICA, V43, P6

[2] TRAP STRUCTURE OF PYROLYTIC AL2O3 IN MOS CAPACITORS [J]. APPLIED PHYSICS LETTERS, 1973, 22 (03) : 106 - 107

[3] HUGHES HL, 1971, 9TH ANN P REL PHYS, P33

[4] HUGHES HL, 1972, IEEE T NUCL SCI, VNS19, P256

[5] HUGHES HL, 1969, IEEE NUCL S, VNS16, P195

[6] PEEL JL, 1970, APP PHYS LETT, V17, P1

[7] POWELL RJ, 1971, IEEE T NUCL SCI, VNS18, P99

[8] SCHLESIER KM, 1972, IEEE NUCL S, VNS19, P275

[9] VACUUM ULTRAVIOLET ABSORPTION IN ALKALI DOPED FUSED SILICA AND SILICATE GLASSES [J]. JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1971, 32 (10) : 2373 - &

[10] VOLOGDIN EN, 1973, SOV PHYS SEMICOND+, V6, P1143

[1] DONOVAN RP, 1972, J APP PHYS COMMUNICA, V43, P6

[2] TRAP STRUCTURE OF PYROLYTIC AL2O3 IN MOS CAPACITORS [J]. APPLIED PHYSICS LETTERS, 1973, 22 (03) : 106 - 107

[3] HUGHES HL, 1971, 9TH ANN P REL PHYS, P33

[4] HUGHES HL, 1972, IEEE T NUCL SCI, VNS19, P256

[5] HUGHES HL, 1969, IEEE NUCL S, VNS16, P195

[6] PEEL JL, 1970, APP PHYS LETT, V17, P1

[7] POWELL RJ, 1971, IEEE T NUCL SCI, VNS18, P99

[8] SCHLESIER KM, 1972, IEEE NUCL S, VNS19, P275

[9] VACUUM ULTRAVIOLET ABSORPTION IN ALKALI DOPED FUSED SILICA AND SILICATE GLASSES [J]. JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1971, 32 (10) : 2373 - &

[10] VOLOGDIN EN, 1973, SOV PHYS SEMICOND+, V6, P1143