ADVANCES IN NEAR-FIELD HOLOGRAPHIC GRATING MASK TECHNOLOGY

被引：14

作者：

TENNANT, DM

DREYER, KF

FEDER, K

GNALL, RP

KOCH, TL

KOREN, U

MILLER, BI

VARTULI, C

YOUNG, MG

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1994年 / 12卷 / 06期

关键词：

D O I：

10.1116/1.587641

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：3689 / 3694

页数：6

共 11 条

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[7] CHARACTERIZATION OF NEAR-FIELD HOLOGRAPHY GRATING MASKS FOR OPTOELECTRONICS FABRICATED BY ELECTRON-BEAM LITHOGRAPHY [J].

TENNANT, DM ;

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[8] MULTIWAVELENGTH DISTRIBUTED-BRAGG-REFLECTOR LASER ARRAY FABRICATED USING NEAR-FIELD HOLOGRAPHIC PRINTING WITH AN ELECTRON-BEAM GENERATED PHASE GRATING MASK [J].

TENNANT, DM ;

KOCH, TL ;

VERDIELL, JM ;

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[9]

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[10]

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