INTERFACE CHARACTERISTICS OF REACTIVELY SPUTTERED AL2O3-SI STRUCTURE

被引：7

作者：

TANAKA, T

IWAUCHI, S

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 1969年 / 8卷 / 06期

关键词：

D O I：

10.1143/JJAP.8.730

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：730 / +

页数：1

共 24 条

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[10]

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