X-POINT DEFORMATION POTENTIALS OF III-V SEMICONDUCTORS IN A TIGHT-BINDING APPROACH

被引:29
作者
MUNOZ, MC [1 ]
ARMELLES, G [1 ]
机构
[1] CSIC,CTR NACL MICROELECTR,E-28006 MADRID,SPAIN
来源
PHYSICAL REVIEW B | 1993年 / 48卷 / 04期
关键词
D O I
10.1103/PhysRevB.48.2839
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The hydrostatic E1 and shear E2 deformation potentials of the III-V semiconductor compounds are calculated within a nearest-neighbor tight-binding approach. In the sp3s* parametrization, analytical expressions for both E1 and E2 are derived. The scaling law of the s*p interaction is modified in such a way that it provides deformation potentials at X in reasonable agreement with available experimental data. This phenomenological term takes into account the physical behavior of the actual excited states under strain and consequently, it allows us to describe accurately the dependence of the band-edge states under (001) biaxial strain.
引用
收藏
页码:2839 / 2842
页数:4
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