RADIOFREQUENCY GLOW-DISCHARGE ION-SOURCE FOR HIGH-RESOLUTION MASS-SPECTROMETRY

被引：22

作者：

SAPRYKIN, AI

MELCHERS, FG

BECKER, JS

DIETZE, HJ

机构：

[1] FORSCHUNGSZENTRUM JULICH, FORSCHUNGSZENTRUM, ZENT ABT CHEM ANAL, D-52425 JULICH, GERMANY

[2] RUSSIAN ACAD SCI, INST ORGAN CHEM, NOVOSIBIRSK 630090, RUSSIA

来源：

FRESENIUS JOURNAL OF ANALYTICAL CHEMISTRY | 1995年 / 353卷 / 5-8期

关键词：

D O I：

10.1007/BF00321325

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

A radio-frequency powered glow discharge ion source has been developed for a double-focusing mass spectrometer. The sputtering and ionization of conducting, semiconducting and insulating materials have been realized using a 13.56 MHz generator to supply the discharge operating potential. The glow discharge ion source operates stably at argon pressures of 0.1-1 hPa and radio frequency powers of 10-50 W. The influence of discharge parameters and gas inlet system on sputtering rates and ion signal intensities for semi-insulating gallium arsenide wafers has been investigated.

引用

页码：570 / 574

页数：5

共 7 条

[1]

CHAPMAN B, 1980, GLOW DISCHARGE PROCE, pCH5

[2] SAMPLING AN RF-POWERED GLOW-DISCHARGE SOURCE WITH A DOUBLE QUADRUPOLE MASS-SPECTROMETER [J].