TEMPERATURE-DEPENDENT PHOTOEMISSION STUDIES OF ELECTRONIC STATES OF CUBR

被引：42

作者：

LIN, SF

SPICER, WE

BAUER, RS

机构：

[1] STANFORD UNIV, STANFORD ELECTR LABS, STANFORD, CA 94305 USA

[2] XEROX CORP, PALO ALTO RES CTR, PALO ALTO, CA 94304 USA

来源：

关键词：

D O I：

10.1103/PhysRevB.14.4551

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：4551 / 4558

页数：8

共 26 条

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LIN, SF
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