CO-BASED SOFT MAGNETIC-FILMS PRODUCED BY ELECTROLESS DEPOSITION

被引:34
作者
OSAKA, T [1 ]
HOMMA, T [1 ]
SAITO, K [1 ]
TAKEKOSHI, A [1 ]
YAMAZAKI, Y [1 ]
NAMIKAWA, T [1 ]
机构
[1] TOKYO INST TECHNOL,DEPT ELECTR CHEM,MIDORI KU,YOKOHAMA,KANAGAWA 227,JAPAN
关键词
D O I
10.1149/1.2069402
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
On the basis of our work on electroless CoB soft magnetic films with high saturation magnetization (Ms) and low coercivity (Hc) the effects of applying an external field during deposition and of adding Fe to the CoB binary system were investigated in order to improve the soft magnetic properties. When an external field (560 G) is applied, the Hc of deposited CoB films decreases from 1.20 Oe to 0.64 Oe. In the case of CoFeB ternary alloy films, FeSO4 is added to the CoB bath and its concentration is varied from 0.001 to 0.05 mol dm-3. The best soft magnetic properties, Hc = 0.72 Oe and Ms = 1180 emu cc-1, are obtained when the film is deposited from the bath containing 0.0025 mol dm-3 of FeSO4. The film had a small magnetostriction value (-4.4 x 10(-7)) and higher permeability. The results of structural analysis suggest that the film consists of fine-particulated hexagonal close-packed crystallite with high crystallinity.
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页码:1311 / 1314
页数:4
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