Laser Reflectogram Method for the Study of Crystal Surfaces and Epitaxial Deposits

被引:6
作者
Cocks, F. H. [1 ]
Das, B. N. [1 ]
Wolff, G. A. [1 ]
机构
[1] Tyco Labs Inc, Waltham, MA USA
关键词
D O I
10.1007/BF00562953
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
When a collimated beam of light is reflected from an etched crystal surface or an epitaxial deposit, the pattern formed by this reflection provides information on the microscopic morphology of the reflecting surface. Using a He/Ne laser as a source of high-intensity collimated light, both SiC etched in ClF(3) and cubic CdS grown epitaxially on GaP have been examined. Certain regions of the SiC were found to give rise to diffraction effects in the resulting reflectrogram. The epitaxial layer of CdS was found to show a threefold symmetry indicative of a {111} deposit and a negligible diffraction effect.
引用
收藏
页码:470 / 473
页数:4
相关论文
共 8 条
[1]  
Chalmers B, 1935, P PHYS SOC LOND, V47, P733
[2]  
Goldschmidt V., 1903, NEUES JB F R MINERAL, V17, P355
[3]   ANALYSIS OF EPITAXIALLY GROWN SEMICONDUCTOR LAYERS BY MEANS OF LIGHT FIGURES [J].
GUALTIERI, JG ;
KERECMAN, AJ .
REVIEW OF SCIENTIFIC INSTRUMENTS, 1963, 34 (01) :108-&
[4]  
VASILEV AP, 1963, SOV PHYS-CRYSTALLOGR, V8, P186
[5]   GROWTH OF WURTZITE CDTE AND SPHALERITE TYPE CDS SINGLE-CRYSTAL FILMS (VAPOR-PHASE EPITAXY X-RAY DIFFRACTION E) [J].
WEINSTEIN, M ;
WOLFF, GA ;
DAS, BN .
APPLIED PHYSICS LETTERS, 1965, 6 (04) :73-+
[6]  
WOLFF GA, 1957, Z ELEKTROCHEM, V61, P101
[7]   ON THE ETCHING OF II-VI-COMPOUNDS AND III-V-COMPOUNDS [J].
WOLFF, GA ;
FRAWLEY, JJ ;
HIETANEN, JR .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1964, 111 (01) :22-27
[8]  
YAMAMOTO M, 1941, SCI REP TOHOKU U, V29, P113