REFRACTIVE-INDEX CHANGES IN FUSED-SILICA PRODUCED BY HEAVY-ION IMPLANTATION FOLLOWED BY PHOTOBLEACHING

被引:40
作者
ALBERT, J [1 ]
MALO, B [1 ]
HILL, KO [1 ]
JOHNSON, DC [1 ]
BREBNER, JL [1 ]
LEONELLI, R [1 ]
机构
[1] UNIV MONTREAL,DEPT PHYS,RECH PHYS & TECHNOL COUCHES MINCES GRP,MONTREAL H3C 3J7,QUEBEC,CANADA
关键词
D O I
10.1364/OL.17.001652
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
The changes in refractive index, optical absorption, and volume of synthetic fused silica resulting from the implantation of germanium and silicon ions at energies of 3 and 5 MeV are reported. Implantation changes the density and generates ultraviolet color centers m the silica, which increases the refractive index at visible wavelengths by approximately 1%. Irradiation of the implanted samples with 249-nm light from a KrF excimer laser photobleaches the color centers and reduces the index by more than 0.1%. Photobleaching is used to write a 4.3-mum pitch diffraction grating in the implanted silica.
引用
收藏
页码:1652 / 1654
页数:3
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