EFFECT OF LOCAL LAYER-THICKNESS DEVIATION ON X-RAY-DIFFRACTION OF MULTILAYERS

被引:3
作者
GUO, SP [1 ]
HE, XC [1 ]
WU, ZQ [1 ]
机构
[1] UNIV SCI & TECHNOL CHINA,CTR FUNDAMENTAL PHYS,HEFEI 230026,PEOPLES R CHINA
关键词
D O I
10.1063/1.351332
中图分类号
O59 [应用物理学];
学科分类号
摘要
A simulation of Cu L-alpha and Cu K-alpha diffractions from W/Si multilayers with a local layer-thickness deviation at various depths of the multilayers has been presented. The results show that the peak intensity decreases rapidly at first while increasing the depth of the local deviation, and then the peak splits into double peaks. But, afterward, the double peaks coincide again. These changes are affected by the ratios (x) of heavy-atom layer thickness to total period thickness. The intensities of the double peaks are nearly equal when x is 0.5, but are quite different when x is 0.22. The changes due to the local deviation are different from those due to random fluctuations or systematic deviations in periods. An explanation has been carried out by the amplitude-phase diagrams.
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页码:715 / 719
页数:5
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