WETTING KINETICS AND THE INTERFACIAL INTERACTION BEHAVIOR BETWEEN ELECTROLESS NI-CU-P AND MOLTEN SOLDER

被引:8
作者
LEE, CY
LIN, KL
机构
[1] Department of Materials Science and Engineering, National Cheng Kung University, Tainan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1994年 / 33卷 / 5A期
关键词
WETTING KINETICS; INTERFACIAL INTERACTION; ELECTROLESS; INTERMETALLIC COMPOUND; SESSILE DROP METHOD;
D O I
10.1143/JJAP.33.2684
中图分类号
O59 [应用物理学];
学科分类号
摘要
Formation of intermetallic compounds and wetting kinetics between an electroless Ni-Cu-P deposit and molten solder were investigated. The microstructure and phase of the interface were investigated with the aid of scanning electron-microscopy (SEM) and X-ray diffractometry (XRD). Intermetallic compounds Ni3Sn4 and Ni3Sn2 were formed between Ni-Cu-P deposit and solder with Cu existing in the intermetallic layer. The contact angles of molten solder on a Ni-Cu-P deposit, measured with the sessile drop method, decrease with increasing temperature and time. The activation energy for wetting of molten solder on a Ni-Co-P deposit was estimated to be 193.7 kJ mol-1.
引用
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页码:2684 / 2688
页数:5
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