DESIGN CURVES FOR PREDICTING FAST-NEUTRON-INDUCED RESISTIVITY CHANGES IN SILICON

被引:22
作者
BUEHLER, MG
机构
来源
PROCEEDINGS OF THE INSTITUTE OF ELECTRICAL AND ELECTRONICS ENGINEERS | 1968年 / 56卷 / 10期
关键词
D O I
10.1109/PROC.1968.6728
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
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页码:1741 / &
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