CONCENTRATION DEPENDENCE OF FRENKEL-PAIR-DEFECT ANNEALING IN ELECTRON-IRRADIATED TA AND NB

被引:8
作者
MYHRA, S
DEFORD, JW
机构
[1] Department of Physics, University of Utah, Salt Lake City
来源
PHYSICAL REVIEW | 1969年 / 188卷 / 03期
关键词
D O I
10.1103/PhysRev.188.1093
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
The present work is an investigation into the dose dependence of the annealing spectra of Ta and Nb from 15 to 285°K after bombardment with 2.2-MeV electrons. Ta and Nb samples were irradiated to different defect concentrations, then simultaneously annealed isochronally from 14.7 up to 285°K. In Ta, recovery peaks were observed at 23, 51, 65, 123, and 170°K. The position of the peak near 170°K is dose-dependent and shows the characteristics of a second-order reaction. In Nb, recovery peaks were observed at 26.5, 58, 95, and 135°K. The peak at 95°K is dose-dependent and follows second-order kinetics initially, with an apparent shift to higher order toward the end of the stage. A two-interstitial model seems to give the best fit to the data. © 1969 The American Physical Society.
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页码:1093 / &
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