DEUTERIUM-ION-BEAM IMPURITIES PRODUCED BY A GAS-DISCHARGE ION-SOURCE (DUOPIGATRON)

被引：3

作者：

BICKES, RW

OHAGAN, JB

机构：

[1] Sandia Laboratories, Albuquerque

来源：

JOURNAL OF APPLIED PHYSICS | 1979年 / 50卷 / 05期

关键词：

D O I：

10.1063/1.326363

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Mass-spectroscopic analyses of dc deuterium-ion beams produced by a duopigatron ion source were carried out. These analyses showed that under normal operating conditions the beams contained less than 1% of impurities and consisted primarily of masses 12, 14, 16, 18, 20, and 22 and some metal ions. The source of the metal contaminants was the secondary cathode. Several cathode materials including Mo, Al, Al2O3, BN, and TiB2 were tested.

引用

页码：3247 / 3249

页数：3

共 6 条

[1] GAS-DISCHARGE ION-SOURCE .1. DUOPLASMATRON [J].