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MELTING OF AL SURFACES

被引：147
作者：
VANDERGON, AWD
SMITH, RJ
GAY, JM
OCONNOR, DJ
VANDERVEEN, JF
机构：
[1] FOM-Institute for Atomic and Molecular Physics, 1098 SJ Amsterdam
来源：
SURFACE SCIENCE | 1990年 / 227卷 / 1-2期
关键词：
D O I：
10.1016/0039-6028(90)90402-T
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
The thermal disordering of Al(110) and Al(111) surfaces was studied up to temperatures of 0.5 and 1.2 K below the bulk melting point Tm, respectively. With the use of medium energy ion scattering it was found that surface melting is present on the (110) face but not on the (111) face. The (110) disordered layer thickness increases with temperature as ln[ Tm (T>m - T)]. The result in terms of a thermodynamic model that was presented earlier to explain the melting of Pb surfaces. © 1990.
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页码：143 / 149
页数：7
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