LOW-TEMPERATURE CHEMICAL VAPOR-DEPOSITION TUNGSTEN CARBIDE COATINGS FOR WEAR EROSION RESISTANCE

被引：24

作者：

GARG, D ^{[1
]}

DYER, PN ^{[1
]}

DIMOS, DB ^{[1
]}

SUNDER, S ^{[1
]}

HINTERMANN, HE ^{[1
]}

MAILLAT, M ^{[1
]}

机构：

[1] CTR SUISSE ELECTR & MICROTECH SA,NEUCHATEL,SWITZERLAND

来源：

JOURNAL OF THE AMERICAN CERAMIC SOCIETY | 1992年 / 75卷 / 04期

关键词：

chemical vapor deposition; coatings; microscopy; tungsten carbide; wear;

D O I：

10.1111/j.1151-2916.1992.tb04176.x

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

A new chemical vapor deposition (CVD) process has been developed to deposit hard coatings, containing tungsten carbide, at temperatures below 500-degrees-C. These coatings, which have been applied to both ferrous and nonferrous alloys, exhibit excellent resistance to wear and erosion. The coatings comprise a mixture of tungsten and the tungsten carbide, the latter being present as W2C, W2C + W3C, or W3C. The coatings' composition and properties can be controlled by varying the CVD process parameters. The unique lamellar, fine-grained microstructures of these coatings contribute to their good tribological properties.

引用

页码：1008 / 1011

页数：4

共 8 条

[1] CHEMICAL VAPOR-DEPOSITED TUNGSTEN CARBIDE WEAR-RESISTANT COATINGS FORMED AT LOW-TEMPERATURES [J].

ARCHER, NJ ;

YEE, KK .

WEAR, 1978, 48 (02) :237-250

[2]

GIBEAUT WA, 1966, COATING HIGH TEMPERA, P101

[3]

HINTERMANN HE, 1984, VDI BER, V506, P131

[4] WEAR BY PARTICULATES [J].

HUTCHINGS, IM .

CHEMICAL ENGINEERING SCIENCE, 1987, 42 (04) :869-878

[5]

WIGOTSKY V, 1982, DES ENG-LONDON, V53, P30

[6]

YEE KK, 1978, INT METALL REV, V226, P19

[7]

YEE KK, 1978, SULZER TECH REV, P105

[8]

1980, ASTM C63379 STAND TE

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