POST-IRRADIATION POLYMERIZATION OF E-BEAM NEGATIVE RESISTS - THEORETICAL-ANALYSIS AND METHOD OF INHIBITION

被引:20
作者
OHNISHI, Y
ITOH, M
MIZUNO, K
GOKAN, H
FUJIWARA, S
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1981年 / 19卷 / 04期
关键词
D O I
10.1116/1.571185
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:1141 / 1144
页数:4
相关论文
共 9 条
[1]   GEL FORMATION IN NEGATIVE ELECTRON RESISTS [J].
ATODA, N ;
KAWAKATSU, H .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1976, 123 (10) :1519-1524
[2]   GEL FORMATION AND MOLECULAR WEIGHT DISTRIBUTION IN LONG-CHAIN POLYMERS [J].
CHARLESBY, A .
PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL AND PHYSICAL SCIENCES, 1954, 222 (1151) :542-557
[3]  
MORISHITA H, 1973, Patent No. 7315536
[4]  
OHNISHI Y, 1978, Patent No. 149333
[5]  
OHNISHI Y, 1979, Patent No. 7956689
[6]  
OHNISHI Y, 1979, Patent No. 7917014
[7]   LITHOGRAPHY AND RADIATION-CHEMISTRY OF EPOXY CONTAINING NEGATIVE ELECTRON RESISTS [J].
THOMPSON, LF ;
FEIT, ED ;
HEIDENRE.RD .
POLYMER ENGINEERING AND SCIENCE, 1974, 14 (07) :529-533
[8]  
1977, 38TH ANN M JAP APPL
[9]  
1974, Patent No. 3801538