ON THE USE OF ACTINOMETRY TO MEASURE THE DISSOCIATION IN O-2 DC GLOW-DISCHARGES - DETERMINATION OF THE WALL RECOMBINATION PROBABILITY

被引:164
作者
PAGNON, D
AMORIM, J
NAHORNY, J
TOUZEAU, M
VIALLE, M
机构
[1] Laboratoire de Physique des Gaz et des Plasmas, CNRS, Université Paris XI, Orsay Cedex
关键词
D O I
10.1088/0022-3727/28/9/014
中图分类号
O59 [应用物理学];
学科分类号
摘要
A study has been performed to re-investigate the actinometric technique used to determine the absolute concentration of O atoms in DC O-2 flowing glow discharges for pressures ranging from 0.36 to 2 Torr and discharge currents ranging from 5 to 80 mA in Pyrex tubes of three different diameters (16, 7 and 4 mm). Actinometric measurements using O(P-3 - S-3) 844 nm, O(P-5 - S-5) 777 nm and Ar(2p(1) - 1s(2)) 750 nm transitions are compared to VUV absorption spectrometry. The choice of the excitation cross sections for the calculations of atomic excitation rates as a function of the reduced electric field using a Boltzmann code and the contribution of the quenching processes of the excited states are discussed. The dissociation ratio [O]/[O-2] can be determined from the ratio of intensities I-B44/I-750 by the relation [O]/[O-2] = C-3p(2p1) I-844/I-750 We have found that C-3p(2p1) remains constant (C-3P(2p1) = 2.6 x 10(-3)) throughout the range of experimental conditions investigated. The recombination probability gamma of the O atoms at the wail is calculated and correlated to the wall temperature of the Pyrex tubes. The variation of the recombination probability as a function of the wall temperature is fitted by the relation gamma = 0.94 exp(-1780/T-wall) for 300 < T-wall < 500 K.
引用
收藏
页码:1856 / 1868
页数:13
相关论文
共 43 条
[1]  
AMORIM J, 1991, P ISPC BOCHUM
[2]   ELECTRON-IMPACT EXCITATION OF ARGON ATOM [J].
BALLOU, JK ;
LIN, CC ;
FAJEN, FE .
PHYSICAL REVIEW A, 1973, 8 (04) :1797-1807
[3]   ABSOLUTE 2-PHOTON ABSORPTION AND 3-PHOTON IONIZATION CROSS-SECTIONS FOR ATOMIC OXYGEN [J].
BAMFORD, DJ ;
JUSINSKI, LE ;
BISCHEL, WK .
PHYSICAL REVIEW A, 1986, 34 (01) :185-198
[4]   THE RATE OF COLLISIONAL QUENCHING OF N2O+ (B2-SIGMA), N-2(+) (B-2-SIGMA), O-2(+) (B(4)SIGMA), O+ (3D), O (3P), AR+ (4P'), AR (4P,4P') AT THE TEMPERATURE LESS-THAN-OR-EQUAL-TO-200K [J].
BELIKOV, AE ;
KUSNETSOV, OV ;
SHARAFUTDINOV, RG .
JOURNAL OF CHEMICAL PHYSICS, 1995, 102 (07) :2792-2801
[5]   QUENCHING OF 2-PHOTON-EXCITED H(3S, 3D) AND O(3P 3P2,1,0) ATOMS BY RARE-GASES AND SMALL MOLECULES [J].
BITTNER, J ;
KOHSEHOINGHAUS, K ;
MEIER, U ;
JUST, T .
CHEMICAL PHYSICS LETTERS, 1988, 143 (06) :571-576
[6]   OXYGEN AND FLUORINE ATOM KINETICS IN ELECTRON-CYCLOTRON RESONANCE PLASMAS BY TIME-RESOLVED ACTINOMETRY [J].
BOOTH, JP ;
SADEGHI, N .
JOURNAL OF APPLIED PHYSICS, 1991, 70 (02) :611-620
[7]  
BOOTH JP, 1991, J APPL PHYS, V60, P618
[8]   STUDY OF VOLUME AND SURFACE PROCESSES IN LOW-PRESSURE RADIO-FREQUENCY PLASMA REACTORS BY PULSED EXCITATION METHODS .1. HYDROGEN ARGON PLASMA [J].
BOUCHOULE, A ;
RANSON, P .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1991, 9 (02) :317-326
[9]   EPR INVESTIGATION OF PLASMA-CHEMICAL RESIST ETCHING IN O-2 AND O-2/CF4 DISCHARGES [J].
BREITBARTH, FW ;
DUCKE, E ;
TILLER, HJ .
PLASMA CHEMISTRY AND PLASMA PROCESSING, 1990, 10 (03) :377-399
[10]   MICROWAVE DISCHARGE SOURCE FOR ATOMIC AND MOLECULAR BEAM PRODUCTION [J].
BRINK, GO ;
FLUEGGE, RA ;
HULL, RJ .
REVIEW OF SCIENTIFIC INSTRUMENTS, 1968, 39 (08) :1171-&