AFFECTING FACTORS ON SURFACE-WAVE-PRODUCED PLASMA

被引:50
作者
KOMACHI, K
机构
[1] Research & Development Division, Sumitomo Metal Industries Ltd., Amagasaki 660
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1993年 / 11卷 / 01期
关键词
D O I
10.1116/1.578284
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Distribution of surface-wave-produced plasmas and profiles of electric field on a dielectric line under plasma production were measured using a surface-wave-plasma (SWP) applicator with a plasma area of 180 X 300 mm2. While the profile of the electric field in a direction of microwave propagation showed existence of a standing wave, the plasma, such as emission intensity or ion current, had a flat distribution. The electric field and the plasma had flat distribution in a direction perpendicular to the microwave propagation. Besides, they were hardly dependent on chamber pressure. Therefore, a uniform plasma is stably produced in the present SWP applicator and can be produced over a larger area.
引用
收藏
页码:164 / 167
页数:4
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KOMACHI, K ;
KOBAYASHI, S ;
ARAKI, H ;
TANI, T .
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