REACTIONS OF ATOMIC OXYGEN (O(P-3)) WITH VARIOUS POLYMER-FILMS

Thin films of various polymers were exposed at ambient temperature to ground-state oxygen atoms (O(3P)) downstream from a radio-frequency O2 plasma or glow discharge. The polymer films examined were a polyimide (Kapton), poly(ethylene terephthalate), polystyrene, high- and low-density polyethylenes, poly(vinyl fluoride), poly(vinylidene fluoride), alternating tetrafluoroethylene-ethylene copolymer, polytetrafluoroethylene, and tetrafluoroethylene-hexafluoropropylene copolymer. The etch rate data for Kapton fit reasonably well a logarithmic plot, with positive slope, of reaction probability versus O(3P) impact energy. ESCA spectra of Kapton before and after reaction with O(3P) indicated steady-state competition between surface recession (etching) and oxidation.