AZIDE PHOTORESISTS FOR PROJECTION PHOTOLITHOGRAPHY

被引：10

作者：

CLECAK, NJ

COX, RJ

MOREAU, WM

机构：

[1] IBM CORP,RES DIV,SAN JOSE,CA 95113

[2] IBM CORP,SPD,E FISHKILL,NY 12524

来源：

关键词：

D O I：

10.1002/pen.760140705

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

引用

页码：491 / 493

页数：3

共 9 条

[1]

AGNIHOTRI RK, 1972, PHOTOGR SCI ENG, V16, P443

[2]

CLECAK N, 1972, Patent No. 3695886

[3]

EFROS LS, 1970, VYSOKOMOL SOEDIN A, V12, P2211

[4]

HANCE CR, 1968, ULTRA MICROMINIATURI

[5]

HTOO MS, 1968, PHOTOGR SCI ENG, V12, P169

[6]

Maissel L.I., 1970, HDB THIN FILM TECHNO

[7]

MOREAU W, 1970, TECHNICAL PAPERS

[8] PHOTOLYSIS OF AROMATIC AZIDES .3. QUANTUM YIELD AND MECHANISM [J].

REISER, A ;

MARLEY, R .

TRANSACTIONS OF THE FARADAY SOCIETY, 1968, 64 (547P) :1806-&

[9]

1960, Patent No. 2940853