SPUTTERING PROCESS OF A SILICON-CARBIDE SURFACE WITH ENERGETIC IONS BY MEANS OF AN AES-SIMS-FDS COMBINED SYSTEM

被引：37

作者：

MOHRI, M

WATANABE, K

YAMASHINA, T

机构：

来源：

JOURNAL OF NUCLEAR MATERIALS | 1978年 / 75卷 / 01期

关键词：

D O I：

10.1016/0022-3115(78)90023-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

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页码：7 / 13

页数：7

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