OXIDATION OF TIN ON SILICON SUBSTRATE BY RAPID ISOTHERMAL PROCESSING

被引：34

作者：

SINGH, R ^{[1
]}

CHOU, P ^{[1
]}

RADPOUR, F ^{[1
]}

NELSON, AJ ^{[1
]}

ULLAL, HS ^{[1
]}

机构：

[1] SOLAR ENERGY RES INST,GOLDEN,CO 80401

来源：

关键词：

D O I：

10.1063/1.344271

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2381 / 2387

页数：7

共 29 条

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