SENSITIVITY OF PHOTOREFRACTIVE PROCESSES

[1] ALPHONSE GA, 1975, RCA REV, V36, P213

[2] ELECTRON DIFFUSION EFFECTS DURING HOLOGRAM RECORDING IN CRYSTALS [J]. APPLIED PHYSICS LETTERS, 1971, 18 (01) : 22 - &

[3] HOLOGRAPHIC PATTERN FIXING IN ELECTRO-OPTIC CRYSTALS [J]. APPLIED PHYSICS LETTERS, 1971, 18 (12) : 540 - &

[4] OPTICALLY-INDUCED REFRACTIVE INDEX INHOMOGENEITIES IN LINBO3 AND LITAO3 - (FERROELECTRIC MATERIALS - NONLINEAR OPTICS - E) [J]. APPLIED PHYSICS LETTERS, 1966, 9 (01) : 72 - +

[5] LASER INDUCED REFRACTIVE INDEX INHOMOGENEITIES AND ABSORPTION SATURATION EFFECTS IN CDS [J]. IEEE JOURNAL OF QUANTUM ELECTRONICS, 1967, QE 3 (10) : 400 - &

[6] ASHKIN A, 1969, J APPL PHYS, V40, P3389

[7] BYER RL, 1972, FERROELECTRICS, V3, P33

[8] CHANUSSOT G, 1975, DEC INT C LOW LYING

[9] CHANUSSOT G, 1974, ANN PHYS, V8, P281

[10] OXYGEN-OCTAHEDRA FERROELECTRICS .I. THEORY OF ELECTRO-OPTICAL AND NONLINEAR OPTICAL EFFECTS [J]. JOURNAL OF APPLIED PHYSICS, 1969, 40 (02) : 720 - +

[1] ALPHONSE GA, 1975, RCA REV, V36, P213

[2] ELECTRON DIFFUSION EFFECTS DURING HOLOGRAM RECORDING IN CRYSTALS [J]. APPLIED PHYSICS LETTERS, 1971, 18 (01) : 22 - &

[3] HOLOGRAPHIC PATTERN FIXING IN ELECTRO-OPTIC CRYSTALS [J]. APPLIED PHYSICS LETTERS, 1971, 18 (12) : 540 - &

[4] OPTICALLY-INDUCED REFRACTIVE INDEX INHOMOGENEITIES IN LINBO3 AND LITAO3 - (FERROELECTRIC MATERIALS - NONLINEAR OPTICS - E) [J]. APPLIED PHYSICS LETTERS, 1966, 9 (01) : 72 - +

[5] LASER INDUCED REFRACTIVE INDEX INHOMOGENEITIES AND ABSORPTION SATURATION EFFECTS IN CDS [J]. IEEE JOURNAL OF QUANTUM ELECTRONICS, 1967, QE 3 (10) : 400 - &

[6] ASHKIN A, 1969, J APPL PHYS, V40, P3389

[7] BYER RL, 1972, FERROELECTRICS, V3, P33

[8] CHANUSSOT G, 1975, DEC INT C LOW LYING

[9] CHANUSSOT G, 1974, ANN PHYS, V8, P281

[10] OXYGEN-OCTAHEDRA FERROELECTRICS .I. THEORY OF ELECTRO-OPTICAL AND NONLINEAR OPTICAL EFFECTS [J]. JOURNAL OF APPLIED PHYSICS, 1969, 40 (02) : 720 - +