ELECTRON-BEAM EVAPORATOR FOR INSITU DEPOSITION STUDIES OF REFRACTORY-METAL THIN-FILMS IN UHV ELECTRON-MICROSCOPE

被引：8

作者：

MORI, KI

KOBAYASHI, K

TAKAYANAGI, K

YAGI, K

HONJO, G

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 1980年 / 19卷 / 01期

关键词：

D O I：

10.1143/JJAP.19.183

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：183 / 189

页数：7

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