STABILITY OF RF-SPUTTERED ALUMINUM-OXIDE

被引：25

作者：

GARDNER, RA ^{[1
]}

PETERSON, PJ ^{[1
]}

KENNEDY, TN ^{[1
]}

机构：

[1] IBM CORP,DIV GEN PROD,SAN JOSE,CA 95114

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1977年 / 14卷 / 05期

关键词：

D O I：

10.1116/1.569346

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1139 / 1145

页数：7

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