RF DRIVEN MULTICUSP H-ION SOURCE

被引：59

作者：

LEUNG, KN

DEVRIES, GJ

DIVERGILIO, WF

HAMM, RW

HAUCK, CA

KUNKEL, WB

MCDONALD, DS

WILLIAMS, MD

机构：

[1] Lawrence Berkeley Laboratory, University of California, Berkeley

来源：

REVIEW OF SCIENTIFIC INSTRUMENTS | 1991年 / 62卷 / 01期

关键词：

D O I：

10.1063/1.1142315

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

An rf driven multicusp source capable of generating 1-ms H- beam pulses with a repetition rate as high as 150 Hz has been developed. This source can be operated with a filament or other types of starter. There is almost no lifetime limitation and a clean plasma can be maintained for a long period of operation. It is demonstrated that rf power as high as 25 kW could be coupled inductively to the plasma via a glass-coated copper-coil antenna. The extracted H- current density achieved is about 200 mA/cm2.

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收藏

页码：100 / 104

页数：5

相关论文

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