REDUCTION OF BEAM DAMAGE BY CRYOPROTECTION AT 4K

被引：22

作者：

DUBOCHET, J ^{[1
]}

KNAPEK, E ^{[1
]}

DIETRICH, I ^{[1
]}

机构：

[1] SIEMENS AG, FORSCHUNGSLAB, D-8000 MUNCHEN 83, FED REP GER

来源：

关键词：

D O I：

10.1016/S0304-3991(81)80180-5

中图分类号：

TH742 [显微镜];

学科分类号：

摘要：

引用

页码：77 / 80

页数：4

共 12 条

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[3] DIETRICH I, 7TH EUR C EL MICR
[4] DUBOCHET J, 1979, CHEM SCRIPTA, V14, P267
[5] FOX F, 1978, 9TH P INT C EL MICR, V2, P342
[6] RADIATION-DAMAGE RELATIVE TO TRANSMISSION ELECTRON-MICROSCOPY OF BIOLOGICAL SPECIMENS AT LOW-TEMPERATURE - REVIEW
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TAYLOR, KA
[J]. JOURNAL OF MICROSCOPY, 1978, 112 (JAN) : 127 - 138
[7] LIMITATIONS TO SIGNIFICANT INFORMATION IN BIOLOGICAL ELECTRON MICROSCOPY AS A RESULT OF RADIATION DAMAGE
GLAESER, RM
[J]. JOURNAL OF ULTRASTRUCTURE RESEARCH, 1971, 36 (3-4): : 466 - &
[8] GLAESER RM, 1978, 9TH P INT C EL MICR, V3, P70
[9] RATE OF DAMAGE OF POLYMER CRYSTALS IN ELECTRON MICROSCOPE - DEPENDENCE ON TEMPERATURE AND BEAM VOLTAGE
GRUBB, DT
GROVES, GW
[J]. PHILOSOPHICAL MAGAZINE, 1971, 24 (190): : 815 - &
[10] Isaacson M.S., 1977, PRINCIPLES TECHNIQUE, V7, P1