LETHAL INTERACTION BETWEEN ULTRAVIOLET-VIOLET RADIATIONS AND METHYL METHANE SULFONATE IN REPAIR PROFICIENT AND REPAIR DEFICIENT STRAINS OF ESCHERICHIA-COLI

被引:12
作者
CORREIA, IS
TYRRELL, RM
机构
[1] Lnstituto de Biofisica, Centro de Ciências Da Saúde, Universidade Federal Do Rio de Janeiro., Rio de Janeiro
关键词
D O I
10.1111/j.1751-1097.1979.tb07084.x
中图分类号
Q5 [生物化学]; Q7 [分子生物学];
学科分类号
071010 ; 081704 ;
摘要
Abstract— The lethal interaction between monochromatic radiation at various wavelengths and methyl methane sulphonate was tested in strains of Escherichia coli proficient and deficient in DNA repair. In the repair proficient wild‐type strain K12 AB1157, the efficiency of sensitization to MMS as a function of dose (at 334 nm, 365 nm and 405 nm) was found to be directly correlated with the dose necessary to remove the shoulder from the survival curve at the wavelength employed. The 365 nm: MMS interaction was also observed in other repair proficient E. coli strains (W3110 and B/r) but was absent in a recA and a polA strain. Pre‐treatment of AB1157 with MMS leads to a much larger interaction than pre‐irradiation with 365 nm. It is concluded that dose‐dependent damage to DNA repair by the near‐UV radiation is involved in the interaction and possibly that MMS causes irreversible damage 10 repair enzymes. Copyright © 1979, Wiley Blackwell. All rights reserved
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页码:521 / 526
页数:6
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