CHARACTERIZATION OF METAL-CONTAINING AMORPHOUS HYDROGENATED CARBON-FILMS

被引：71

作者：

WANG, M ^{[1
]}

SCHMIDT, K ^{[1
]}

REICHELT, K ^{[1
]}

DIMIGEN, H ^{[1
]}

HUBSCH, H ^{[1
]}

机构：

[1] FRAUNHOFER INST SCHICHT & OBERFLACHENTECH, W-2000 HAMBURG 54, GERMANY

来源：

JOURNAL OF MATERIALS RESEARCH | 1992年 / 7卷 / 03期

关键词：

D O I：

10.1557/JMR.1992.0667

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Metal-containing amorphous hydrogenated carbon (Me-C:H) films were prepared on silicon substrates. Two kinds of metals (Ti, Ta) were incorporated in the process of reactive rf diode - (13.56 MHz) and DC-magnetron sputtering, respectively. Elastic recoil detection (ERD) and Rutherford backscattering (RBS) of MeV He+ ions were used to determine the hydrogen content and mass density of Me-C:H films. The mechanical properties, i.e., microhardness, Young's modulus, and adhesion, were measured with the help of a nanoindenter and scratch tester. Results show that (1) the mechanical properties of Me-C:H films depend mainly on metal concentrations. At a certain metal concentration, optimal hardness, Young's modulus, and critical load were obtained; (2) the Me-C:H films with an optimal metal concentration possess similar hardness, Young's modulus, and higher critical load compared with the corresponding values of diamond-like carbon (a-C:H) films, due to the improvement of the toughness of the films by the incorporation of metals. Therefore, Me-C:H films show high promise of being wear-resistant protective coatings.

引用

页码：667 / 676

页数：10

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