HETEROEPITAXIAL GROWTH OF MNS ON GAAS SUBSTRATES

被引:52
作者
OKAJIMA, M
TOHDA, T
机构
[1] Central Research Laboratories, Matsushita Electric Industrial Co., Ltd., Moriguchi, Osaka, 570, 3-15, Yagumo-naka-machi
关键词
D O I
10.1016/0022-0248(92)90862-D
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Epitaxial growth characteristics of MnS onto GaAs substrates with different orientations have been investigated by X-ray diffraction and reflection high energy electron diffraction (RHEED). Growth of MnS films has been performed by molecular beam epitaxy (MBE). Epitaxial films of wurtzite type MnS (gamma-MnS) in a single phase have been grown on GaAs(111) substrates at 200-degrees-C. The epitaxial gamma-MnS films shows good crystallinity, where full width at half maximum (FWHM) of the X-ray rocking curve is lower than 100 arc sec. On the other hand, the films on GaAs(001) at the same growth temperature exhibit multiphase crystal structures of zinc-blende and rock-salt in early growth stages, and change the main structure to wurtzite with increasing thickness. Photoluminescence spectra of the gamma-MnS films at 77 K exhibit an orange emission band around 570 nm which is attributed to Mn2+ ions, and red emission bands around 620 and 690 nm which would be attributed to Mn2+ ion pairs. The band gap energy of the gamma-MnS was estimated to be 3.9 eV from the excitation spectra.
引用
收藏
页码:810 / 815
页数:6
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