EPITAXIAL YBA2CU3O7-Y BOLOMETERS ON MICROMACHINED WINDOWS IN SILICON-WAFERS

被引：41

作者：

LI, Q

FENNER, DB

HAMBLEN, WD

HAMBLEN, DG

机构：

[1] Superconductivity Group, AFR, Inc., East Hartford, CT 06108

来源：

APPLIED PHYSICS LETTERS | 1993年 / 62卷 / 19期

关键词：

D O I：

10.1063/1.109386

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Epitaxial YBCO thin-film bolometers have been successfully fabricated on thin Si(100) substrates. Substrates included prethinned wafers ranging from 400 mum down to 4 mum thick, and a window, 0.75 mum thick, micromachined into a 400-mum wafer. As the Si is made thinner, the speed and responsivity both improve considerably. A 500-mus rise time was achieved on the micromachined window bolometer (0.75-mum-thick Si) under chopped infrared illumination. Calculations of heat flow in Si windows are in excellent agreement with the observed window-bolometer response waveform.

引用

页码：2428 / 2430

页数：3

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