A NEW METHODOLOGY FOR THE DESIGN CENTERING OF IC FABRICATION PROCESSES

被引：25

作者：

LOW, KK

DIRECTOR, SW

机构：

[1] CARNEGIE MELLON UNIV,DEPT ELECT & COMP ENGN,PITTSBURGH,PA 15213

[2] CARNEGIE MELLON UNIV,COMP AIDED DESIGN RES CTR,PITTSBURGH,PA 15213

来源：

IEEE TRANSACTIONS ON COMPUTER-AIDED DESIGN OF INTEGRATED CIRCUITS AND SYSTEMS | 1991年 / 10卷 / 07期

关键词：

D O I：

10.1109/43.87599

中图分类号：

TP3 [计算技术、计算机技术];

学科分类号：

0812 ;

摘要：

This paper describes a practical methodology that can be applied to optimize the process yield of IC fabrication lines. The yield maximazation problem is first reformulated into a deterministic design centering problem. Macromodeling and problem decomposition are then applied to solve the design centering problem efficiently. The effectivenes of this methodology is illustrated through a simulation example involving a CMOS process adopted from an industrial line.

引用

收藏

页码：895 / 903

页数：9

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