Overview of growth and behaviour of clusters and particles in plasmas

被引:97
作者
Garscadden, A. [1 ]
Ganguly, B. N. [1 ]
Haaland, P. D. [1 ]
Williams, J. [1 ]
机构
[1] USAF, Wright Lab, Wright Patterson AFB, OH 45433 USA
关键词
D O I
10.1088/0963-0252/3/3/001
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
A review is presented of the phenomena associated with particles in low pressure plasmas. Dust particles which are typically micrometers in diameter have been observed by laser light scattering in various low-pressure, radiofrequency-excited plasmas. Experiments have been designed so that the origin of the dust material is unambiguous and, to some extent, quantitative. The processes involved in the appearance of the mesoscopic dust particles are outlined and compared with our experimental observations. The source material and its required generation rate, nucleation, charging, growth mechanisms, growth rates, and saturation mechanisms are discussed. The mutual influences of dust and plasma, particularly the role of geometric and circuit boundary conditions in laboratory plasmas, are described.
引用
收藏
页码:239 / 245
页数:7
相关论文
共 37 条
[1]  
ABRAHAM AA, HOMOGENEOUS NUCLEATI
[2]   TRANSPORT OF DUST PARTICLES IN GLOW-DISCHARGE PLASMAS [J].
BARNES, MS ;
KELLER, JH ;
FORSTER, JC ;
ONEILL, JA ;
COULTAS, DK .
PHYSICAL REVIEW LETTERS, 1992, 68 (03) :313-316
[3]   CHARACTERISTICS OF A DUSTY NONTHERMAL PLASMA FROM A PARTICLE-IN-CELL MONTE-CARLO SIMULATION [J].
BOEUF, JP .
PHYSICAL REVIEW A, 1992, 46 (12) :7910-7922
[4]   PARTICLE PARTICLE INTERACTIONS IN DUSTY PLASMAS [J].
BOUFENDI, L ;
BOUCHOULE, A ;
PORTEOUS, RK ;
BLONDEAU, JP ;
PLAIN, A ;
LAURE, C .
JOURNAL OF APPLIED PHYSICS, 1993, 73 (05) :2160-2162
[5]   DISTINCTION BETWEEN NEGATIVE IONS AND CHARGED DUST IN PLASMAS [J].
BRESLIN, AC ;
EMELEUS, KG .
INTERNATIONAL JOURNAL OF ELECTRONICS, 1971, 31 (02) :189-&
[6]   FAST DEPOSITION OF AMORPHOUS-CARBON AND SILICON LAYERS [J].
BUURON, AJM ;
MEEUSEN, GJ ;
BEULENS, JJ ;
VANDESANDEN, MCM ;
SCHRAM, DC .
JOURNAL OF NUCLEAR MATERIALS, 1993, 200 (03) :430-433
[7]   PHYSICAL-PROPERTIES OF CONTAMINATION PARTICLE TRAPS IN A PROCESS PLASMA [J].
CARLILE, RN ;
GEHA, SS .
JOURNAL OF APPLIED PHYSICS, 1993, 73 (10) :4785-4793
[8]  
CHANDLER D, 1987, INTRO MODERN STAT ME, P84
[9]  
CHOI SJ, 1993, APPL PHYS LETT, V18, P2197
[10]   ELECTROSTATIC FORCES ON SMALL PARTICLES IN LOW-PRESSURE DISCHARGES [J].
DAUGHERTY, JE ;
PORTEOUS, RK ;
GRAVES, DB .
JOURNAL OF APPLIED PHYSICS, 1993, 73 (04) :1617-1620