RF REACTIVELY SPUTTERED SUPERCONDUCTING NBNX FILMS

被引：14

作者：

KESKAR, KS

YAMASHITA, T

ONODERA, Y

GOTO, Y

ASO, T

机构：

[1] TOHOKU UNIV, RES INST ELECT COMM, SENDAI, JAPAN

[2] TOHOKU UNIV, FAC ENGN, SENDAI, JAPAN

来源：

JOURNAL OF APPLIED PHYSICS | 1974年 / 45卷 / 07期

关键词：

D O I：

10.1063/1.1663730

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：3102 / 3105

页数：4

共 29 条

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KIRNER, H .

ZEITSCHRIFT FUR ANORGANISCHE UND ALLGEMEINE CHEMIE, 1964, 328 (1-2) :34-43

[2] DIE NITRIDE DES NIOBS [J].

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[3] NITRIDPHASEN DES NIOBS [J].

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[4] CRITICAL FIELD MEASUREMENTS OF SUPERCONDUNCTING NIOBIUM NITRIDE [J].

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[5] HIGH FIELD PROPERTIES OF PURE NIOBIUM NITRIDE THIN FILMS [J].

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JOURNAL OF APPLIED PHYSICS, 1969, 40 (05) :2153-+

[6] SUPERCONDUCTING PROPERTIES OF NIOBIUM-TITANIUM-NITRIDE THIN FILMS [J].

GAVALER, JR ;

DEIS, DW ;

HULM, JK ;

JONES, CK .

APPLIED PHYSICS LETTERS, 1969, 15 (10) :329-+

[7] VERY HIGH CRITICAL CURRENT AND FIELD CHARACTERISTICS OF NIOBIUM NITRIDE THIN FILMS [J].

GAVALER, JR ;

JANOCKO, MA ;

PATTERSON, A ;

JONES, CK .

JOURNAL OF APPLIED PHYSICS, 1971, 42 (01) :54-+

[8]

Geballe T.H., 1966, PHYSICS, V2, P293

[9] SUPERCONDUCTING THIN FILMS OF NIOBIUM, TANTALUM, TANTALUM NITRIDE, TANTALUM CARBIDE, AND NIOBIUM NITRIDE [J].

GERSTENBERG, D ;

HALL, PM .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1964, 111 (08) :936-942

[10]

GUARD RW, 1967, T METALL SOC AIME, V239, P643

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