ELECTRIC PROBE MEASUREMENTS IN AN ECR PLASMA CVD APPARATUS

被引：38

作者：

SHIRAI, K

IIZUKA, T

GONDA, S

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1989年 / 28卷 / 05期

关键词：

D O I：

10.1143/JJAP.28.897

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：897 / 902

页数：6

共 24 条

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