EFFECTS OF HIGH-TEMPERATURE AND E-BEAM IRRADIATION ON STABILITY OF REFRACTORY THIN-FILMS

被引：14

作者：

LEE, EH ^{[1
]}

POPPA, H ^{[1
]}

机构：

[1] NASA, AMES RES CTR,MOFFETT FIELD,CA 94035

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1977年 / 14卷 / 01期

关键词：

D O I：

10.1116/1.569126

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：223 / 226

页数：4

共 13 条

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[8]

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[9]

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[10] EXPERIMENTAL APPROACHES TO WELL CONTROLLED STUDIES OF THIN-FILM NUCLEATION AND GROWTH [J].

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