POTENTIAL SPUTTERING OF LITHIUM-FLUORIDE BY SLOW MULTICHARGED IONS

被引：116

作者：

NEIDHART, T

PICHLER, F

AUMAYR, F

WINTER, HP

SCHMID, M

VARGA, P

机构：

[1] Institut für Allgemeine Physik, Technische Universität Wien, A-1040 Wien, Wiedner Hauptstrasse

来源：

PHYSICAL REVIEW LETTERS | 1995年 / 74卷 / 26期

关键词：

D O I：

10.1103/PhysRevLett.74.5280

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

Thin polycrystalline LiF films have been bombarded by slow (≤1 keV) multicharged Arq+ ions (q≤9), in order to study the resulting total sputter yields by means of a quartz crystal microbalance. More than 99% of sputtered particles are neutral and show yields, at given impact energy, in proportion to the potential energy of projectile ions. The respective "potential sputtering" process already takes place far below 100 eV impact energy. It can be related to defect production in LiF following electron capture by the multicharged ions, and removes about one LiF molecule per 100 eV of projectile potential energy. © 1995 The American Physical Society.

引用

页码：5280 / 5283

页数：4

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