OBSERVATION OF X-RAY INTERFERENCES ON THIN-FILMS OF AMORPHOUS SILICON

被引：65

作者：

SEGMULLER, A ^{[1
]}

机构：

[1] IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA

来源：

THIN SOLID FILMS | 1973年 / 18卷 / 02期

关键词：

D O I：

10.1016/0040-6090(73)90107-7

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：287 / 294

页数：8

共 18 条

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DEVANT, G ;

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[9]

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[10]

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