CU3N THIN-FILM FOR A NEW LIGHT RECORDING MEDIA

被引:161
作者
ASANO, M [1 ]
UMEDA, K [1 ]
TASAKI, A [1 ]
机构
[1] UNIV TSUKUBA,INST APPL PHYS,TSUKUBA,IBARAKI 305,JAPAN
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1990年 / 29卷 / 10期
关键词
Copper nitride thin film; Ion-assisted deposition; Optical recording;
D O I
10.1143/JJAP.29.1985
中图分类号
O59 [应用物理学];
学科分类号
摘要
Copper nitride thin films were prepared by using the ion-assisted deposition in which accelerated nitrogen ions were irradiated during the deposition of copper metal. The degree of nitrification of the film was controlled by changing the ion current density. The reflection coefficient of the prepared copper nitride films decreased with the increase of the ion current density. The reflection coefficient was about 30% at 780 nm wavelength, and it recovered to 70% after the film was heated at 300°C. The preliminary experiment of write-once optical recording of this film was carried out, and the viability of its practical use in new media was confirmed. © 1990 IOP Publishing Ltd.
引用
收藏
页码:1985 / 1986
页数:2
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