KRYPTON ENTRAPMENT IN PULSE-BIASED SPUTTER-DEPOSITED METALS

被引：5

作者：

BAYNE, MA

MOSS, RW

MCCLANAHAN, ED

机构：

来源：

关键词：

D O I：

10.1016/0040-6090(78)90392-9

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：327 / 336

页数：10

共 10 条

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