DIFFERENTIAL DISSOLUTION AND ELECTRON-BEAM LITHOGRAPHIC SENSITIVITY OF POLY(METHYL METHACRYLATE)

被引：2

作者：

HELBERT, JN

COOK, CF

POINDEXTER, EH

WAGNER, BE

机构：

[1] USA,ELECTR TECHNOL & DEVICES LAB,FT MONMOUTH,NJ 07703

[2] RUTGERS STATE UNIV,SCH CHEM,NEW BRUNSWICK,NJ 08903

来源：

POLYMER ENGINEERING AND SCIENCE | 1977年 / 17卷 / 06期

关键词：

D O I：

10.1002/pen.760170617

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

引用

页码：414 / 419

页数：6

共 15 条

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ASMUSSEN, F ;

UEBERREITER, K .

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[3]

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[5] BREAKDOWN OF METHYL METHACRYLATE POLYMER BY HIGH-ENERGY RADIATION [J].

CHARLESBY, A ;

ROSS, M .

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CHARLESBY A, 1960, ATOMIC RADIATION POL

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INDUSTRIAL AND ENGINEERING CHEMISTRY, 1942, 34 :764-770

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[9]

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[10]

MOORE WR, 1953, J POLYM SCI A, V1, P929

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