COHERENT PROCESSES AT SURFACES - FREE-INDUCTION DECAY AND PHOTON-ECHO OF THE SI-H STRETCHING VIBRATION FOR H/SI(111)

被引:159
作者
GUYOTSIONNEST, P
机构
[1] Laboratoire Pour l'Utilisation du Rayonnement Electromagnetique, Centre Universitaire paris'Sud, Orsay
关键词
D O I
10.1103/PhysRevLett.66.1489
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Using short infrared pulses and sum-frequency up-conversion, the dephasing of the transient polarization of the Si-H adsorbate-substrate vibration is followed in real time. At 120 K, dephasing due to homogeneous linewidth or inhomogeneous broadening are separated.
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页码:1489 / 1492
页数:4
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