CONDUCTION IN AL-SIO-AU STRUCTURES

被引：9

作者：

JOURDAIN, M ^{[1
]}

DESPUJOLS, J ^{[1
]}

机构：

[1] UER SCI EXACTES & NAT, LAB ELECTRON & RAYONS 10, MOULIN HOUSSE, 51062 REIMS, FRANCE

来源：

THIN SOLID FILMS | 1973年 / 17卷 / 03期

关键词：

D O I：

10.1016/0040-6090(73)90140-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：329 / 333

页数：5

共 12 条

[1]

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[2]

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[3] 3-DIMENSIONAL POOLE-FRENKEL EFFECT [J].

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[4] ELECTRICAL CONDUCTION THROUGH SIO FILMS [J].

HARTMAN, TE ;

BLAIR, JC ;

BAUER, R .

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[5] POOLE-FRENKEL CONSTANT [J].

HILL, RM .

THIN SOLID FILMS, 1971, 8 (03) :R21-&

[6] POOLE-FRENKEL CONDUCTION IN AMORPHOUS SOLIDS [J].

HILL, RM .

PHILOSOPHICAL MAGAZINE, 1971, 23 (181) :59-&

[7] NON-OHMIC CONDUCTION IN VACUUM-DEPOSITED SIO FILMS [J].

HIROSE, H ;

WADA, Y .

JAPANESE JOURNAL OF APPLIED PHYSICS, 1965, 4 (09) :639-&

[8] ELECTRICAL CONDUCTIVITY IN EVAPORATED SILICON OXIDE FILMS [J].

JOHANSEN, IT .

JOURNAL OF APPLIED PHYSICS, 1966, 37 (02) :499-&

[9]

Jonscher A. K., 1967, THIN SOLID FILMS, V1, P213

[10]

JOURDAIN M, 1972, THESIS REIMS

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