GIGATRON(R) - A NEW SOURCE FOR LOW-PRESSURE PLASMAS

被引：15

作者：

PETASCH, W ^{[1
]}

RAUCHLE, E ^{[1
]}

WEICHART, J ^{[1
]}

BICKMANN, H ^{[1
]}

机构：

[1] BUCK PLASMA ELECTR,D-70794 FILDERSTADT,GERMANY

来源：

SURFACE & COATINGS TECHNOLOGY | 1995年 / 74-5卷 / 1-3期

关键词：

LOW PRESSURE PLASMA; MICROWAVES; PLASMA SOURCES; ETCHING;

D O I：

10.1016/0257-8972(95)08229-8

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

A linearly extended microwave plasma source was developed that is used in the pressure range below 1 kPa. In the Gigatron(R) device, the microwaves (f = 2.45 GHz) are coupled into the vacuum chamber in the form of a coaxial waveguide, consisting of an inner copper rod and a surrounding quartz tube with atmospheric pressure between them. The plasma is produced outside the quartz tube and forms the outer conductor of a coaxial waveguide. The homogeneity and the I extension of the plasma were investigated with respect to process parameters as a function on the radial and axial distances from the plasma source. It is shown that the plasma can be extended to a length of more than Im for an applied microwave power of 1.2 kW.

引用

页码：200 / 205

页数：6