MICROSTRUCTURAL EVOLUTION OF A SILICON-OXIDE PHASE IN A PERFLUOROSULFONIC ACID IONOMER BY AN IN-SITU SOL-GEL REACTION

被引:137
作者
MAURITZ, KA
STEFANITHIS, ID
DAVIS, SV
SCHEETZ, RW
POPE, RK
WILKES, GL
HUANG, HH
机构
[1] UNIV SO MISSISSIPPI,DEPT BIOL,HATTIESBURG,MS 39406
[2] VIRGINIA POLYTECH INST & STATE UNIV,DEPT CHEM ENGN,BLACKSBURG,VA 24061
关键词
D O I
10.1002/app.1995.070550120
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
Nanocomposites were produced via sol-gel reactions for tetraethylorthosilicate within the cluster morphology of perfluorosulfonic acid films. Small-angle x-ray scattering revealed that the polar/nonpolar nanophase-separated morphological template persists despite invasion by the silicon oxide phase. Scanning electron microscopy (ESEM-EDAX) studies have indicated that the greatest silicon oxide concentration occurs near the surface and decreases to a minimum in the middle. Optical and ESEM micrographs revealed a brittle, surface-attached silica layer at high silicon oxide contents. (C) 1995 John Wiley & Sons, Inc.
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页码:181 / 190
页数:10
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