THIN-FILMS OF UNIFORM THICKNESS BY PULSED LASER DEPOSITION

被引：18

作者：

IANNO, NJ

ERINGTON, KB

机构：

[1] Center for Microelectronic and Optical Materials Research, Department of Electrical Engineering, University of Nebraska-Lincoln, Lincoln

来源：

REVIEW OF SCIENTIFIC INSTRUMENTS | 1992年 / 63卷 / 06期

关键词：

D O I：

10.1063/1.1143762

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

In order to enhance the utility of pulsed laser deposition, a method to deposit uniform films has been devised. The target and substrate are offset from each other and the substrate is rotated about its axis between laser pulses. We have simulated this process using experimentally determined deposition profiles. Films of uniform thickness to within a few percent across a substrate 5.08 cm in diameter have been fabricated, where we have obtained excellent agreement between theory and experiment.

引用

页码：3525 / 3526

页数：2

共 7 条

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