X-RAY PHOTOELECTRON AND AUGER SPECTROSCOPIC STUDY OF UNDERPOTENTIAL DEPOSITION OF AG AND CU ON PT ELECTRODES

被引：38

作者：

HAMMOND, JS ^{[1
]}

WINOGRAD, N ^{[1
]}

机构：

[1] PURDUE UNIV, DEPT CHEM, W LAFAYETTE, IN 47907 USA

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1977年 / 124卷 / 06期

关键词：

D O I：

10.1149/1.2133420

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：826 / 833

页数：8

共 40 条

[1] ELECTRON-STRUCTURE OF NA AND K ADSORBED ON NI(100) [J].

ANDERSSON, S ;

JOSTELL, U .

SURFACE SCIENCE, 1974, 46 (02) :625-640

[2]

Bowles B.J., 1965, ELECTROCHIM ACTA, V10, P731, DOI [10.1016/0013-4686(65)80039-1, DOI 10.1016/0013-4686(65)80039-1]

[3] FORMATION OF MONOLAYERS OF COPPER ON PLATINUM ELECTRODES [J].

BOWLES, BJ .

ELECTROCHIMICA ACTA, 1970, 15 (04) :589-&

[4] ELECTROCHEMICAL FORMATION AND DISSOLUTION OF DIFFERENT TYPES OF COPPER LAYERS ON PLATINUM [J].

BREITER, MW .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1967, 114 (11) :1125-&

[5] CRITICAL INTERPRETATION OF ELECTRODEPOSITION STUDIES INVOLVING TRACES OF ELEMENTS [J].

BYRNE, JT ;

ROGERS, LB .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1951, 98 (11) :457-463

[6]

BYRNE JT, 1951, J ELECTROCHEM SOC, V98, P452

[7] ROTATING RING-DISK STUDY OF UNDERPOTENTIAL DEPOSITION OF COPPER AT PLATINUM IN 0.5M HYDROCHLORIC ACID [J].

CADLE, SH ;

BRUCKENSTEIN, S .

ANALYTICAL CHEMISTRY, 1971, 43 (07) :932-+

[8] INHIBITION OF HYDROGEN ADSORPTION BY SUBMONOLAYER DEPOSITION OF METALS ON PLATINUM [J].

CADLE, SH ;

BRUCKENS.S .

ANALYTICAL CHEMISTRY, 1971, 43 (13) :1858-&

[9]

DICKINSON T, 1975, J CHEM SOC FARAD T 1, V71, P289

[10] ADSORPTION OF MERCURY ON TUNGSTEN (100) STUDIED BY ULTRAVIOLET PHOTOELECTRON-SPECTROSCOPY [J].

EGELHOFF, WF ;

PERRY, DL ;

LINNETT, JW .

SURFACE SCIENCE, 1976, 54 (03) :670-674

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