ROOM-TEMPERATURE CW OPERATION OF INGAASP-INP HETEROSTRUCTURE LASERS EMITTING AT 1-56 MU-M

被引:39
作者
AKIBA, S
SAKAI, K
MATSUSHIMA, Y
YAMAMOTO, T
机构
[1] KDD Research and Development Laboratories, Tokyo 153, Meguro-ku
关键词
Semiconductor junction lasers;
D O I
10.1049/el:19790435
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Room-temperature c.w. operation of InGaAsP/InP heterostructure lasers grown by liquid-phase epitaxy was achieved at 1·56 µm. An active InGaAsP layer was essentially sandwiched by InP, though a thin InGaAsP buffer layer was deposited to prevent the melt-back of the active layer. Threshold current was typically 300 mA for a 17 µm wide oxide-defined stripe laser. © 1979, The Institution of Electrical Engineers. All rights reserved.
引用
收藏
页码:606 / 607
页数:2
相关论文
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YAMAMOTO T, UNPUBLISHED